The effectiveness of RO-EDI purified water equipment in the entire electronic production process cannot be underestimated. In the industrial production of electronic devices, semiconductor materials, LCD screens, and solar power generation, extremely pure ultrapure water systems are usually required to be used in the manufacturing process. If the purified water body cannot meet the requirements of the production process for tap water or if the water body is unstable, it will endanger the actual effectiveness and service life of the post-processing technology.

In the production and manufacturing of rectifier tubes in the photovoltaic industry, if residues are infiltrated into them, it will endanger the transmission of electronic devices, thereby endangering the enlarged characteristics and service life of rectifier tubes. In the production and manufacturing of picture tubes and cathode rays, a layer of transparent chemical substance is adhered to the inner cavity of the display screen by spray painting or ion exchange method. If it is mixed with pure water containing copper above 8ppb, it will cause brightness and color loss; Iron elements above 50ppb can cause brightness, fading, dimming, flickering, and lead to waste products such as bubbles, streaks, and transparent spots. In the 12 production processes of black and white picture tube display screens, pure water is required for 5 processes including glass shell cleaning, deposition, humidity, film washing, and neck cleaning. For each crystal transistor produced, 80kg of industrial pure water is required.

The screen of the LCD screen needs to be cleaned with pure water and mixed with pure water. If there are residues such as metal ions, microbial strains, and particles in pure water, it can cause common faults in the power circuit of the LCD screen, endanger the quality of the LCD screen, and cause damage and scrap. In the production and manufacturing of crystal transistors and integrated circuit chips, purified water is crucial for cleaning single crystal silicon wafers, and there is also a small amount used for medicinal solution preparation. It is a water vapor source for air oxidation of single crystal silicon wafers, cooling circulating water for some machinery and equipment, and electroplating process solution preparation. The product quality and manufacturing yield of integrated circuit chips are closely related.

Alkaline earth metals (K, Na, etc.) in water can cause poor compression resistance of the insulation layer film, excessive heavy metals (Au, Ag, Cu, etc.) can reduce the compression resistance of the PN junction, Group III elements (B, Al, Ga, etc.) can cause malignant changes in the characteristics of N-type semiconductors, Group V elements (P, As, Sb, etc.) can cause malignant changes in the characteristics of P-type semiconductors, and the high-temperature carbonization of phosphorus (about 20%~50% of ash content) by bacteria in water can cause some areas on P-type monocrystalline silicon wafers to transform into N-type silicon, affecting the characteristics of electronic components. The particles (including bacteria) in water, if adsorbed on the surface of a single crystal silicon wafer, can cause circuit short circuits or decreased characteristics. Therefore, the quality of water is crucial. The RO-EDI purified water equipment processing technology can achieve the standardization of ultra pure water systems.

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