The key to traditional ultra pure water equipment is electrodialysis and ion exchangers (cation bed, anion bed, composite bed, cation resin). The new semiconductor material ultra pure water equipment adopts excellent EDI (continuous electric desalination technology) machine equipment. EDI is a new type of desalination technology that combines electrodialysis technology with ion exchange resin technology in organic chemistry. It can effectively remove most of the ions in water, and the resistance of the water output can remain stable at 15M Ω Above CM, continuous operation, no chemical pollution, and high water utilization rate have strong advantages and broad application prospects in the preparation process of ultrapure water. Based on the ion exchange column and the selection of permeable ion exchange resin, high desalination efficiency can be achieved. It can be processed in conjunction with reverse osmosis system software to produce high-end pure water with a resistance of 10-17M Ω· CM.

We are committed to the research, development, production, and processing of semiconductor material ultra pure water equipment. At the same time, this facility is also suitable for solving ultra pure water equipment used in the solar photovoltaic industry, ultra pure water used in PCBs, ultra pure water used in televisions, and ultra pure water used in recorders. Utilize water resources that meet regulations, minimize environmental pollution of machinery and equipment, increase their service life, and reduce the amount of maintenance tasks for operators. In terms of process technology, the water used in China's drinking water standards is raw water, equipped with medium filters, activated carbon filters, potassium ion softeners, reverse osmosis equipment, and other components to form a preliminary treatment system software. The RO reverse osmosis software system is equipped with working pressure protection equipment, online water quality monitoring and control instruments, and electrical equipment uses PLC program controllers, truly achieving no one to supervise. In the selection of processing materials, we adopt a strongly recommended and customer requirements unified approach, making the machine equipment more cost-effective and stable compared to other similar industries.

Semiconductor material ultra pure water equipment for producing ultra pure water process

1. The ion exchange method (ion exchange process parameters) is adopted, and the process is as follows: raw water, pressurized water pump, multi-media filter, multi-media filter, softening water equipment, reverse osmosis equipment, cation epoxy resin filtration bed, anion epoxy resin filtration bed, cation anion epoxy resin cation resin microporous filter, water point

2. The two-stage reverse osmosis method is adopted, and the process is as follows: pressurized water pump for raw water, multi-media filter, multi-media filter, softened water equipment, reverse osmosis equipment, first stage reverse osmosis pH adjustment, middle water storage tank, second stage reverse osmosis (reverse osmosis membrane surface with positive electricity), purification of water storage tank, pure centrifugal water pump, microporous filter, water consumption point

Introduction to Semiconductor Materials Ultra Pure Water Solution Equipment

3. The EDI method is used, and the process is as follows: pressurized water pump for raw water, multi-media filter, multi-media filter, softened water equipment, reverse osmosis equipment, first stage reverse osmosis machine, middle water storage tank, middle centrifugal water pump, EDI system software, microporous filter, water consumption point

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